➀ EUV Tech, Inc. has introduced the next generation of EUV zoneplate microscopy, the AIRES microscope, which captures and characterizes photomask defects.

➁ The AIRES microscope has a patented low-aberration zoneplate imaging system and supports a variety of enhanced imaging modes for defect classification.

➂ The technology enables photomask manufacturers to make targeted repairs without expensive print checks and is designed for lower cost of ownership.