Recent #EUV Technology news in the semiconductor industry
➀ Chinese researchers have developed an EUV light source platform that operates at internationally competitive parameters, a breakthrough for the domestic production of advanced chips;
➁ The team, led by Lin Nan, has achieved world-class results in photolithography research using a solid-state laser-driven approach;
➂ The platform, based on a solid-state laser, has reached more than half of the conversion efficiency rate of commercially available CO2 laser-driven light sources, surpassing previous international benchmarks.
➀ The demand for advanced node chips supporting AI is growing rapidly, putting pressure on the industry to meet demand;
➁ EUV lithography technology is critical for manufacturing these chips, and its stability requires continuous investment and improvement;
➂ The ongoing research and development in various aspects, from new photoresists to more powerful light sources, aims to improve the cost-effectiveness of EUV.