<p>➀ The demand for advanced node chips supporting AI is growing rapidly, putting pressure on the industry to meet demand;</p><p>➁ EUV lithography technology is critical for manufacturing these chips, and its stability requires continuous investment and improvement;</p><p>➂ The ongoing research and development in various aspects, from new photoresists to more powerful light sources, aims to improve the cost-effectiveness of EUV.</p>
Related Articles
- Diamond-on-Si process for quantum magnetometers2 months ago
- Imec and Zeiss extend strategic partnership2 months ago
- Intel 18A running at 20-30% yields, says top analyst3 months ago
- TSMC Invests 730 Billion Yuan in US Expansion, CEO Wei Zhejia Speaks, Trump Listens3 months ago
- High NA EUV Lithography Machine Achieves Significant Milestone3 months ago
- Intel Insider: Giving Wafer Fab Control to TSMC Would Be a Terrible Mistake!3 months ago
- Intel principal engineer bemoans potential TSMC takeover, touts company's 18A tech advantage3 months ago
- Birmingham Uni and Paragraf get £3.4m for graphene R&D5 months ago
- Quantum Motion ICs fabbed by GloFo5 months ago
- Suggestions for Intel's Wafer Fab5 months ago