➀ Samsung plans to introduce its first High-NA EUV equipment, ASML’s EXE:5000, by the end of 2024 or early 2025, primarily for foundry operations. ➁ The company aims for full commercialization of High-NA EUV technology by 2027, collaborating with EDA companies to develop new mask designs. ➂ SK hynix is set to bring in ASML’s next-generation High-NA EUV machine, the EXE:5200, in 2026, with plans to apply it to advanced DRAM production.