➀ Intel is moving its second High NA EUV tool to its Oregon development fab to focus on the development of its 14A generation of chips. ➁ The $380 million machine is expected to enable 2D feature scaling with up to 2.9x more density compared to existing EUV tools. ➂ Intel plans to use both 0.33NA EUV and 0.55NA EUV alongside other lithography processes for IC development and manufacturing.