<p>➀ The article discusses the role of absorber materials in high-NA EUV lithography and their impact on imaging.</p><p>➁ The development of EUV mask technology is driven by multi-beam mask writers, with Intel and Infineon among the key players.</p><p>➂ The European Mask and Lithography Conference 2024 highlighted advancements in EUV technology, including high-NA EUV, e-beam mask patterning, AI applications, and advanced lithography resins.</p>