<p>➀ The 11th Luminaries survey report by eBeam Initiative indicates a strong purchase prediction for multi-beam mask writers, promoting the growth of EUV and step-and-repeat lithography masks.</p><p>➁ Experts discussed the challenges faced in the adoption of step-and-repeat lithography masks at an event held concurrently with the SPIE Mask Technology Conference.</p><p>➂ The survey involved industry leaders from 44 companies in the semiconductor ecosystem, with Aki Fujimura, CEO of D2S, Inc., and Naoya Hayashi, DNP Honorary Researcher, leading the discussion on the survey results.</p>