<p>➀ Canon has delivered the first commercial version of a technology that could one day revolutionize the manufacturing of the most advanced silicon chips.</p><p>➁ NIL (nanoimprint lithography) can draw circuit features as small as 14 nanometers, matching the level of processors produced by Intel, AMD, and NVIDIA.</p><p>➂ Canon's approach is different from the EUV lithography system produced exclusively by ASML of the Netherlands.</p>
Related Articles
- ASML's Dilemma: High-NA EUV vs Low-NA EUV Multi-Patterning4 months ago
- Imec and Zeiss extend strategic partnership6 months ago
- CEO Interview with Dinesh Bettadapur of Irresistible Materials6 months ago
- The Impenetrable Technological Moat of ASML6 months ago
- High NA EUV Lithography Machine Achieves Significant Milestone6 months ago
- Resist Loss Model for the EUV Stochastic Defectivity Cliffs7 months ago
- Samsung and SK Hynix Diverge on EUV Lithography Technology!8 months ago
- Best Christmas Gift Ever: ASML sells 'Lego' model of its TWINSCAN EXE:5000 High-NA machine8 months ago
- Stochastic Pupil Fill in EUV Lithography9 months ago
- Advanced EUV Lithography: Challenges and Innovations in Photoresist and Etching Techniques9 months ago