<p>➀ IHP, in collaboration with the University of Nagoya, is engaged in research on SiGe epitaxy, nanotechnology, and advanced semiconductor and optoelectronic devices.</p><p>➁ The partnership aims to optimize semiconductor interfaces through new epitaxial techniques and methods to enable the miniaturization of electronic devices.</p><p>➂ The research focuses on SiGe epitaxy processes, properties of silicon-germanium nanowires and nanoparticles for energy-efficient transistors and lasers, and luminescence properties of Si and Ge nanostructures.</p>
Related Articles
- IHP and Nagoya University, Japan, Jointly Develop Next-Generation Semiconductor Technologies4 months ago
- IHP and the University of Nagoya, Japan, Collaboratively Develop Next-Generation Semiconductor Technologies4 months ago
- Loughborough University Physicists Create ‘The World’s Smallest Violin’ Using Nanotechnology2 months ago
- Startup aims to 3D print chips and cut production costs by 90% — nanoprinter operates at wafer scale4 months ago
- Self-Aligned Carbon Nanotube Phototransistors for Infrared Detection4 months ago
- TDK develops 20ps Spin Photo Detector4 months ago
- Novel Caffeine Sensor Based on Zn-SnO2 Nanoparticles4 months ago
- Alphawave Semi sampling photonics interconnect ICs for hyperscalers5 months ago
- ATLANT 3D Secures $15 M Series A+ as Demand Grows for its Atomic Layer Processing Technology5 months ago
- Controlling Light Color and Frequency for Advanced Technologies5 months ago