➀ A major technical breakthrough in domestic lithography machines has been achieved, with the capability to produce 65nm process chips; ➁ The Ministry of Industry and Information Technology has released the 'Guidance Catalog for the Promotion of Application of the First Set of Major Technological Equipment (2024 Edition)', which includes various integrated circuit production equipment; ➂ The breakthrough signifies China's determination to reach an advanced international level in the semiconductor equipment field in the next few years.
Related Articles
- Samsung will reportedly replace silicon with glass interposers in 20285 months ago
 - Will Glass Substrates Become Unnecessary with TSMC SoW-X?6 months ago
 - The Impenetrable Technological Moat of ASML8 months ago
 - South Korea's Semiconductor Technology Almost Entirely Behind China, Say Media Reports8 months ago
 - FD-SOI, Advancing to 7nm9 months ago
 - Over 500 Million Yuan in Investment: Two GaN Projects Accelerate Progress9 months ago
 - Quantum Computing in Silicon: Development of a New European Quantum Technology Begins10 months ago
 - Tower Semiconductor Releases 300mm 65nm 3.3V-Based BCD Power Management Platform11 months ago
 - 0.7nm Era Approaching: Imec and Intel Share Roadmap11 months ago
 - Intel’s 18A on-track for production ramp next year, says foundry GM11 months ago