➀ China's Ministry of Industry and Information Technology announced two domestically-made lithography systems; ➁ The systems include a KrF scanner for 130nm ICs and an ArF scanner for 65nm chips; ➂ China's technology is catching up with Canon, Nikon, and ASML, though still behind in EUV; ➃ Nikon's history of lithography development showcases the rapid progress in the field; ➄ ASML dominates the high-end market with EUV technology, while Nikon and Canon focus on DUV systems; ➅ SMEE is China's leading producer of IC lithography equipment; ➆ The US sanctions on ArF immersion systems push China to accelerate development.