➀ Corning has launched a new ultra-low expansion (ULE) glass material called EXTREME ULE, designed to support High NA EUV lithography for the mass production of advanced microchips. ➁ The material boasts ultra-low thermal expansion, enhancing the performance of EUV masks. ➂ Its exceptional flatness minimizes unnecessary changes in chip manufacturing, allowing for the use of advanced thin films and lithography materials. ➃ EXTREME ULE glass is part of Corning's ULE product line, a titania silicate glass with near-zero expansion properties, traditionally used in EUV masks and lithography mirrors.
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