➀ The three major EDA toolmakers—Cadence, Synopsys, and Siemens EDA—are collaborating with TSMC on AI-driven design flows for advanced chip manufacturing nodes. ➁ IBM Research's Huiming Bu highlights the use of AI and machine learning in developing highly accurate lithography models. ➂ Synopsys' CEO Sassine Ghazi discusses Synopsys.ai's performance improvements and its impact on design and verification processes. ➃ Siemens EDA extends its AI collaboration with fabs like Intel Foundry and TSMC, introducing AI-accelerated simulators and Catapult AI NN software.